The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2022
Filed:
Sep. 21, 2020
Applicant:
Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);
Inventors:
Alejo M. Lifschitz Arribio, Waltham, MA (US);
Jonathan D. Prange, Lincoln, MA (US);
Michael K. Gallagher, Hopkinton, MA (US);
Alexander Zielinski, Charlton, MA (US);
Luis A. Gomez, Holden, MA (US);
Joseph F. Lachowski, Sutton, MA (US);
Assignee:
ROHM AND HAAS ELECTRONIC MATERIALS LLC, Marlborough, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D 5/34 (2006.01); C23F 1/34 (2006.01); C25D 3/38 (2006.01);
U.S. Cl.
CPC ...
C25D 3/38 (2013.01); C25D 5/34 (2013.01);
Abstract
Crystal plane orientation enrichment compounds are applied to copper to modify copper grain orientation distribution to the favorable crystal plain orientation to enhance copper electroplating. Electroplating copper on the modified copper enables faster and selective electroplating.