The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2022
Filed:
Jun. 25, 2020
Applied Materials, Inc., Santa Clara, CA (US);
Kalyanjit Ghosh, Pleasanton, CA (US);
Mayur G. Kulkarni, Bangalore, IN;
Sanjeev Baluja, Campbell, CA (US);
Kien N. Chuc, Cupertino, CA (US);
Sungjin Kim, Palo Alto, CA (US);
Yanjie Wang, Santa Clara, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A processing chamber for processing a substrate is disclosed herein. In one embodiment, the processing chamber includes a liner assembly disposed within an interior volume of the processing chamber, and a C-channel disposed in an interior volume of the chamber, circumscribing the liner assembly. In another embodiment, a process kit disposed in the interior volume of the processing chamber is disclosed herein. The process kit includes a liner assembly, a C-channel, and an isolator disposed in the interior volume. The C-channel and the isolator circumscribe the liner assembly. A method for depositing a silicon based material on a substrate by flowing a precursor gas into a processing chamber is also described herein.