The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 22, 2022

Filed:

May. 12, 2020
Applicant:

Ememory Technology Inc., Hsin-Chu, TW;

Inventors:

Chia-Jung Hsu, Hsinchu County, TW;

Wei-Ren Chen, Hsinchu County, TW;

Wein-Town Sun, Hsinchu County, TW;

Assignee:

eMemory Technology Inc., Hsin-Chu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/45 (2006.01); H01L 29/788 (2006.01); H01L 27/02 (2006.01); H01L 21/28 (2006.01); G11C 16/04 (2006.01); G11C 16/10 (2006.01); G11C 16/14 (2006.01); G11C 16/26 (2006.01); H01L 29/66 (2006.01); H02M 1/14 (2006.01); H02M 3/07 (2006.01); H01L 23/60 (2006.01); H01L 23/62 (2006.01); H02H 9/04 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0274 (2013.01); G11C 16/0433 (2013.01); G11C 16/10 (2013.01); G11C 16/14 (2013.01); G11C 16/26 (2013.01); H01L 23/60 (2013.01); H01L 23/62 (2013.01); H01L 27/0248 (2013.01); H01L 27/0251 (2013.01); H01L 27/0255 (2013.01); H01L 27/0266 (2013.01); H01L 27/0285 (2013.01); H01L 27/0288 (2013.01); H01L 29/40114 (2019.08); H01L 29/456 (2013.01); H01L 29/66825 (2013.01); H01L 29/788 (2013.01); H02H 9/046 (2013.01); H02M 1/14 (2013.01); H02M 3/07 (2013.01);
Abstract

A memory device includes a well, a first gate layer, a second gate layer, a doped region, a blocking layer and an alignment layer. The first gate layer is formed on the well. The second gate layer is formed on the well. The doped region is formed within the well and located between the first gate layer and the second gate layer. The blocking layer is formed to cover the first gate layer, the first doped region and a part of the second gate layer and used to block electrons from excessively escaping. The alignment layer is formed on the blocking layer and above the first gate layer, the doped region and the part of the second gate layer. The alignment layer is thinner than the blocking layer, and the alignment layer is thinner than the first gate layer and the second gate layer.


Find Patent Forward Citations

Loading…