The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11508613 B1

Date of Patent:

Nov. 22, 2022

Filed:

Aug. 14, 2020

Method of healing an implanted layer comprising a heat treatment prior to recrystallisation by laser annealing

Applicant:

Commissariat a L'energie Atomique ET Aux Energies Alternatives, Paris, FR;

Inventors:

Pablo Acosta Alba, Grenoble, FR;

Shay Reboh, Grenoble, FR;

Assignee:

COMMISSARIAT A LENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES, Paris, FR;

Attorney:

Oblon, McClelland, Maier & Neustadt, L.L.P.

Primary Examiner:

Alexander G Ghyka

Int. Cl.

CPC ...

H01L 21/762 (2006.01); H01L 21/02 (2006.01); H01L 21/324 (2006.01);

U.S. Cl.

CPC ...

H01L 21/76254 (2013.01); H01L 21/02686 (2013.01); H01L 21/3247 (2013.01);

Abstract

The invention relates to a method of healing defects related to implantation of species in a donor substrate () made of a semiconducting material to form therein a plane of weakness () in it separating a thin layer () from a bulk part of the donor substrate. The method comprises a superficial amorphisation of the thin layer, followed by application of a heat treatment on the superficially amorphised thin layer. The method comprises application of laser annealing to the superficially amorphised thin layer after the heat treatment, to recrystallise it in the solid phase.

Find Patent Forward Citations

Acosta Alba, Pablo. (2022). Method of healing an implanted layer comprising a heat treatment prior to recrystallisation by laser annealing (U.S. Patent No. 11508613). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11508613

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