The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 22, 2022

Filed:

Oct. 28, 2019
Applicant:

Gudeng Precision Industrial Co., Ltd, New Taipei, TW;

Inventors:

Shu-Hung Lin, New Taipei, TW;

Chia-Ho Chuang, New Taipei, TW;

Ming-Chien Chiu, New Taipei, TW;

Hsin-Min Hsueh, New Taipei, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/673 (2006.01); G03F 1/66 (2012.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67359 (2013.01); G03F 1/66 (2013.01); H01L 21/67294 (2013.01); H01L 21/67376 (2013.01);
Abstract

The instant disclosure discloses a reticle retaining system comprising an inner pod and an outer pod. The inner pod is configured to receive a reticle that includes a first identification feature. The inner pod comprises an inner base having a reticle accommodating region generally at a geometric center thereof and surrounded by a periphery region, and an inner cover configured to establish sealing engagement with the inner base. The inner base has a first observable zone defined in the reticle accommodating region correspondingly arranged to allow observation of the first identification feature. The outer pod is configured to receive the inner base. The outer pod comprises an outer base having a second observable zone defined thereon observably aligned to the first observable zone of the inner pod upon receiving the inner pod, and an outer cover configured to engage the outer base and cover the inner pod.


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