The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 2022
Filed:
Feb. 08, 2021
Applicant:
Kla Corporation, Milpitas, CA (US);
Inventors:
Xinrong Jiang, Palo Alto, CA (US);
Christopher Sears, Fremont, CA (US);
Nikolai Chubun, San Jose, CA (US);
Luca Grella, Gilroy, CA (US);
Assignee:
KLA Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/147 (2006.01); H01L 21/67 (2006.01); G01N 23/00 (2006.01); H01J 37/21 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67288 (2013.01); G01N 23/00 (2013.01); H01J 37/147 (2013.01); H01J 37/21 (2013.01); G01N 2223/6116 (2013.01);
Abstract
An electron source emits an electron beam. The electron beam is received by a beam limiting assembly. The beam limiting assembly has a first beam limiting aperture with a first diameter and a second beam limiting aperture with a second diameter larger than the first diameter. The first beam limiting aperture receives the electron beam. This beam limiting assembly reduces the influence of Coulomb interactions.