The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 2022
Filed:
Apr. 01, 2019
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Inventors:
Sung-Joo An, Seongnam-si, KR;
Jeon-Il Lee, Suwon-si, KR;
Kaoru Yamamoto, Seongnam-si, KR;
Jang-Hee Lee, Yongin-si, KR;
Kee-Young Jun, Seongnam-si, KR;
Geun-O Jeong, Incheon, KR;
Assignee:
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); H01L 21/306 (2006.01); H01J 37/32 (2006.01); H01L 21/67 (2006.01); C23C 16/50 (2006.01); C23C 16/46 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32449 (2013.01); C23C 16/46 (2013.01); C23C 16/50 (2013.01); H01J 37/32357 (2013.01); H01J 37/32522 (2013.01); H01J 37/32724 (2013.01); H01J 37/32807 (2013.01); H01L 21/67017 (2013.01); H01L 21/67103 (2013.01); H01L 21/67115 (2013.01); H01J 2237/3321 (2013.01);
Abstract
A semiconductor manufacturing apparatus includes a process chamber. An insulating plate divides an interior space of the process chamber into a first space and a second space and thermally isolates the first space from the second space. A gas supplier is configured to supply a process gas to the first space. A radiator is configured to heat the first space. A stage is disposed within the second space and the stage is configured to support a substrate.