The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2022
Filed:
Mar. 01, 2021
Method of influencing a charged particle beam, multipole device, and charged particle beam apparatus
Ict Integrated Circuit Testing Gesellschaft Für Halbleiterprüftechnik Mbh, Heimstetten, DE;
Abstract
A method of influencing a charged particle beam () propagating along an optical axis (A) is described. The method includes: guiding the charged particle beam () through at least one opening () of a multipole device () that comprises a first multipole () with four or more first electrodes () and a second multipole () with four or more second electrodes () arranged in the same sectional plane, the first electrodes and the second electrodes being arranged alternately around the at least one opening (); and at least one of exciting the first multipole to provide a first field distribution for influencing the charged particle beam in a first manner, and exciting the second multipole to provide a second field distribution for influencing the charged particle beam in a second manner. Further, a multipole device () with a first multipole () and a second multipole () provided on the same substrate as well as a charged particle beam apparatus () with a multipole device () are provided.