The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2022
Filed:
Apr. 02, 2019
Huazhong University of Science and Technology, Hubei, CN;
Wenyu Yang, Hubei, CN;
Kun Huang, Hubei, CN;
Yi Gao, Hubei, CN;
Shuo Qiu, Hubei, CN;
Tao Wang, Hubei, CN;
Guangdong Cheng, Hubei, CN;
Kun Yang, Hubei, CN;
HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY, Hubei, CN;
Abstract
The present invention belongs to the field of processing residual stress, and discloses a method for calculating processing parameters for residual stress control by parameter inversion. This method comprises: (a) extracting a characteristic index reflecting the residual stress distribution characteristic from a residual stress distribution curve; (b) respectively presetting initial values of processing parameters for residual stress control, calculating an initial value of the characteristic index, and drawing curves of the characteristic index over the respective processing parameters to obtain respective fitted curves; (c) respectively establishing a relation formula between respective characteristic index increment of the processing parameters and the fitting curve; and (d) assigning the values and performing inversion calculation to obtain the required processing parameters. The present invention is simple in operation, reduces the number of tests, lowers the production cost, improves the processing residual stress distribution of the workpiece and improves the anti-fatigue life of the components.