The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 01, 2022

Filed:

Jan. 06, 2021
Applicants:

Shinichiro Takatani, Tokyo, JP;

Riichiro Shirota, Hsinchu, TW;

Inventors:

Shinichiro Takatani, Tokyo, JP;

Riichiro Shirota, Hsinchu, TW;

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/40 (2006.01); H01L 29/778 (2006.01); H01L 29/06 (2006.01); H01L 29/423 (2006.01); H01L 29/51 (2006.01); H01L 29/205 (2006.01); H01L 29/20 (2006.01);
U.S. Cl.
CPC ...
H01L 29/408 (2013.01); H01L 29/0696 (2013.01); H01L 29/42324 (2013.01); H01L 29/7788 (2013.01); H01L 29/2003 (2013.01); H01L 29/205 (2013.01); H01L 29/513 (2013.01); H01L 29/517 (2013.01); H01L 29/518 (2013.01); H01L 29/7786 (2013.01);
Abstract

A normally-off vertical nitride semiconductor transistor device with low threshold voltage variation includes a drift layer containing a nitride semiconductor, a channel region electrically connected to the drift layer, a source electrode, a drain electrode, a gate insulating film, and a gate electrode. The gate insulating film includes at least a first insulating film located at the channel region side, a second insulating film located at the gate electrode side, and a third insulating film between the second insulating film and the gate electrode, wherein the second insulating film has charge traps with energy levels located inside the band gaps of both the first and third insulating films, and the threshold voltage is adjusted by charges accumulated in the charge traps. The threshold voltage is used to block flowing current by substantially eliminating conduction carriers of the channel region by voltage applied to the gate electrode.


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