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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11488860 B1

PDFFull Text
Date of Patent:
Nov. 01, 2022

Filed:

Jul. 24, 2020

Integrated circuit device and method of manufacturing the same

Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Su-jeong Park, Hwaseong-si, KR;

Dong-chan Lim, Hwaseong-si, KR;

Kwang-jin Moon, Hwaseong-si, KR;

Ju-bin Seo, Seongnam-si, KR;

Ju-Il Choi, Seongnam-si, KR;

Atsushi Fujisaki, Seongnam-si, KR;

Assignee:

Samsung Electronics Co., Ltd., Gyeonggi-do, KR;

Attorney:

Harness, Dickey & Pierce, P.L.C.

Primary Examiner:

Daniel P Shook

Int. Cl.
CPC ...
H01L 23/48 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76843 (2013.01); H01L 21/76805 (2013.01); H01L 21/76814 (2013.01); H01L 21/76898 (2013.01); H01L 23/481 (2013.01);
Abstract

An integrated circuit device includes a substrate, a landing pad on the substrate, and a through-via structure passing through the substrate and connected to the landing pad. The through-via structure may include a conductive plug, a first conductive barrier layer covering a sidewall and a lower surface of the conductive plug, and a second conductive barrier layer covering a sidewall of the first conductive barrier layer.

Find Patent Forward Citations

Park, Su-jeong. (2022). Integrated circuit device and method of manufacturing the same (U.S. Patent No. 11488860). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11488860

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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