The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 25, 2022

Filed:

Apr. 07, 2020
Applicant:

Kla Corporation, Milpitas, CA (US);

Inventor:

Stefan Eyring, Weilburg, DE;

Assignee:

KLA CORPORATION, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/73 (2017.01); G03F 7/20 (2006.01); G06T 7/00 (2017.01);
U.S. Cl.
CPC ...
G06T 7/74 (2017.01); G03F 7/70483 (2013.01); G06T 7/001 (2013.01); G06T 2207/30148 (2013.01);
Abstract

A field-of-view at a first modeled target location of a first target disposed on a specimen can be configured, which can include moving the stage relative to the detector. The first modeled target location is determined by summing a first design target location and a navigational error provided by an online model. A first image of the field-of-view is grabbed using the detector. The field-of-view at a second modeled target location of a second target disposed on the specimen is configured. Concurrent with configuring the field-of-view at the second modeled target location, using a processor, the position of a first actual target location is determined using the first image. The online model is updated with a difference between the first design target location and the first actual target location.


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