The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2022
Filed:
Jun. 11, 2019
Asml Netherlands B.v., Veldhoven, NL;
Bart Smeets, Bilzen, BE;
Anita Bouma, De Meern, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Birgitt Noelle Cornelia Liduine Hepp, Waalre, NL;
Paulus Hubertus Petrus Koller, Roermond, NL;
Carsten Andreas Köhler, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method for tuning a target apparatus of a patterning process. The method includes obtaining a reference performance, and measurement data of a substrate subjected to the patterning process at the target apparatus, the measurement data indicative of a performance of the target apparatus; determining a cause of a performance mismatch based on a difference between the reference performance and the performance of the target apparatus, wherein the cause includes an optical characteristic; and responsive to the cause, adjusting an optical parameter associated with an adjustable optical characteristic to reduce the performance mismatch in the optical characteristic.