The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2022
Filed:
Feb. 07, 2020
Ebara Corporation, Tokyo, JP;
Hiroyuki Shinozaki, Tokyo, JP;
Hiroshi Aono, Tokyo, JP;
Tadakazu Sone, Tokyo, JP;
Kenji Shinkai, Tokyo, JP;
Hideo Aizawa, Tokyo, JP;
EBARA CORPORATION, Tokyo, JP;
Abstract
A substrate polishing apparatus includes a polishing tablehaving a polishing surfacein the upper surface, a substrate holding portionthat holds a substrate W having a surface to be polished in the lower surface, and a holding portion coverthat covers the outer side of the substrate holding portion. Between the lower portion of the holding portion coverand the upper surface of the polishing table, a gap portion for intakeis provided, and in the upper portion of the holding portion cover, a pipe for exhaustconnected to an exhaust mechanismis provided. By operating the exhaust mechanism, a rising air current from the gap portiontoward the pipeis formed between the outer surface of the substrate holding portionand the inner surface of the holding portion cover