The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 11, 2022

Filed:

Jan. 19, 2021
Applicant:

Fuji Electric Co., Ltd., Kawasaki, JP;

Inventors:

Takashi Yoshimura, Matsumoto, JP;

Masayuki Miyazaki, Matsumoto, JP;

Hiroshi Takishita, Matsumoto, JP;

Hidenao Kuribayashi, Matsumoto, JP;

Assignee:

FUJI ELECTRIC CO., LTD., Kawasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 21/324 (2006.01); H01L 29/36 (2006.01); H01L 29/66 (2006.01); H01L 29/739 (2006.01); H01L 29/861 (2006.01); H01L 29/08 (2006.01); H01L 21/263 (2006.01); H01L 21/265 (2006.01); H01L 29/32 (2006.01); H01L 29/10 (2006.01);
U.S. Cl.
CPC ...
H01L 29/063 (2013.01); H01L 21/263 (2013.01); H01L 21/26506 (2013.01); H01L 21/26513 (2013.01); H01L 21/324 (2013.01); H01L 29/0834 (2013.01); H01L 29/1095 (2013.01); H01L 29/32 (2013.01); H01L 29/36 (2013.01); H01L 29/66128 (2013.01); H01L 29/7395 (2013.01); H01L 29/861 (2013.01); H01L 29/8611 (2013.01); H01L 29/0619 (2013.01);
Abstract

A semiconductor device including: a semiconductor substrate having a first and a second side, and including a donor layer with a doping concentration profile in a depth direction from the first to the second side. The donor layer includes: a first peak, situated at a first distance from the first side of said substrate; a first region adjacent to the first peak and extending in the depth direction from the first peak toward the first side, a second peak in said doping concentration profile, situated at a second distance from the first side of said substrate. Said second distance is less than said first distance and greater than zero; and a second region adjacent to the second peak and extending in the depth direction from the second peak toward the first side of the substrate, which has a doping concentration which is substantially uniform.


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