The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2022
Filed:
Nov. 13, 2020
Tokyo Electron Limited, Tokyo, JP;
Takaya Kikai, Koshi, JP;
Yuzo Ohishi, Koshi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A substrate processing apparatusincludes a rotating/holding unitconfigured to hold and rotate a wafer W having an organic film on a front surface Wa thereof; a light irradiating unitconfigured to irradiate light for aching of the organic film to the front surface; a gas flow forming unitconfigured to form a gas flow of an oxygen-containing gas which passes between the wafer W and the light irradiating unit; an irradiation control unitconfigured to irradiate the light to the front surface in a state that the gas flow is formed between the wafer W and the light irradiating unit; and a rotation control unitconfigured to rotate the wafer W in a state that the gas flow is formed between the wafer W and the light irradiating unitand the light is irradiated to the front surface.