The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 11, 2022

Filed:

Feb. 17, 2021
Applicant:

Ict Integrated Circuit Testing Gesellschaft Für Halbleiterprüftechnik Mbh, Heimstetten, DE;

Inventor:

Pavel Adamec, Haar, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/065 (2006.01); H01J 37/21 (2006.01); H01J 37/147 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/065 (2013.01); H01J 37/1474 (2013.01); H01J 37/21 (2013.01); H01J 37/28 (2013.01);
Abstract

A charged particle beam apparatus () is described. The charged particle beam apparatus includes a first vacuum region () in which a charged particle beam emitter () for emitting a charged particle beam () along an optical axis (A) is arranged, a second vacuum region () downstream of the first vacuum region and separated from the first vacuum region by a first gas separation wall () with a first differential pumping aperture (), wherein the first differential pumping aperture () is configured as a first beam limiting aperture for the charged particle beam (); and a third vacuum region () downstream of the second vacuum region and separated from the second vacuum region by a second gas separation wall () with a second differential pumping aperture (), wherein the second differential pumping aperture () is configured as a second beam limiting aperture for the charged particle beam (). Further described are a scanning electron microscope and a method of operating a charged particle beam apparatus.


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