The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2022
Filed:
Jul. 19, 2021
The Chinese University of Hong Kong, Shatin, HK;
Yuk-Ming Dennis Lo, Hong Kong, CN;
Rossa Wai Kwun Chiu, Hong Kong, CN;
Kwan Chee Chan, Hong Kong, CN;
Peiyong Jiang, Hong Kong, CN;
Suk Hang Cheng, Hong Kong, CN;
Wenlei Peng, Hong Kong, CN;
On Yee Tse, Hong Kong, CN;
The Chinese University of Hong Kong, Shatin, HK;
Abstract
Systems and methods for using determination of base modification in analyzing nucleic acid molecules and acquiring data for analysis of nucleic acid molecules are described herein. Base modifications may include methylations. Methods to determine base modifications may include using features derived from sequencing. These features may include the pulse width of an optical signal from sequencing bases, the interpulse duration of bases, and the identity of the bases. Machine learning models can be trained to detect the base modifications using these features. The relative modification or methylation levels between haplotypes may indicate a disorder. Modification or methylation statuses may also be used to detect chimeric molecules.