The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 2022
Filed:
Jul. 03, 2019
Applicant:
Asml Netherlands B. V., Veldhoven, NL;
Inventor:
Pieter Willem Herman De Jager, Middelbeers, NL;
Assignee:
ASML NETHERLANDS B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/153 (2006.01); H01J 37/10 (2006.01); H01J 37/147 (2006.01); H01J 37/20 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/153 (2013.01); H01J 37/10 (2013.01); H01J 37/1474 (2013.01); H01J 37/20 (2013.01); H01J 37/28 (2013.01); H01J 2237/1205 (2013.01); H01J 2237/1534 (2013.01); H01J 2237/202 (2013.01); H01J 2237/2817 (2013.01);
Abstract
Systems, methods, and programming are described for inspecting a substrate having a pattern imaged thereon, including obtaining a plurality of selected target locations on the substrate, the selected target locations dependent on characteristics of the pattern, scanning the substrate with a plurality of electron beamlets, wherein the scanning includes individually addressing the beamlets to impinge on the selected target locations independently, detecting a reflected or a transmitted portion of the beamlets, and generating images of the selected target locations.