The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 04, 2022

Filed:

Jan. 12, 2017
Applicant:

Advantest Corporation, Tokyo, JP;

Inventors:

Shinichi Hamaguchi, Tokyo, JP;

Shinji Sugatani, Tokyo, JP;

Masayuki Takahashi, Tokyo, JP;

Masahiro Takizawa, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23K 15/00 (2006.01); B33Y 10/00 (2015.01); B33Y 30/00 (2015.01); B33Y 50/02 (2015.01); H01J 37/06 (2006.01); H01J 37/141 (2006.01); H01J 37/147 (2006.01); H01J 37/305 (2006.01); H01J 29/56 (2006.01);
U.S. Cl.
CPC ...
B23K 15/0086 (2013.01); B23K 15/002 (2013.01); B23K 15/004 (2013.01); B23K 15/0013 (2013.01); B23K 15/0026 (2013.01); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12); B33Y 50/02 (2014.12); H01J 29/563 (2013.01); H01J 37/06 (2013.01); H01J 37/141 (2013.01); H01J 37/147 (2013.01); H01J 37/305 (2013.01); H01J 2237/3128 (2013.01);
Abstract

To provide a three-dimensional printing device that irradiates approximately the same ranges on the surface of a powder layer simultaneously with a plurality of electron beams having different beam shapes. An electron beam columnof the three-dimensional printing deviceincludes a plurality of electron sourcesincluding electron sources having anisotropically-shaped beam generating units, and beam shape deforming elementsthat deform the beam shapes of electron beams output from the electron sourceson a surfaceof a powder layer. A deflectorincluded in the electron beam columndeflects an electron beam output from each of the plurality of electron sourcesby a distance larger than the beam space between electron beams before passing through the deflector


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