The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 2022
Filed:
Oct. 14, 2020
Applicant:
Tel Manufacturing and Engineering of America, Inc., Chaska, MN (US);
Inventor:
Jeffery W. Butterbaugh, Eden Prairie, MN (US);
Assignee:
TEL MANUFACTURING AND ENGINEERING OF AMERICA, INC., Chaska, MN (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/10 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01); B08B 3/08 (2006.01); H01L 21/02 (2006.01); B08B 3/04 (2006.01); H02N 15/00 (2006.01); B08B 11/02 (2006.01); B08B 3/02 (2006.01);
U.S. Cl.
CPC ...
B08B 3/10 (2013.01); B08B 3/024 (2013.01); B08B 3/041 (2013.01); B08B 3/08 (2013.01); B08B 11/02 (2013.01); H01L 21/02101 (2013.01); H01L 21/6719 (2013.01); H01L 21/67051 (2013.01); H01L 21/68764 (2013.01); H01L 21/68785 (2013.01); H02N 15/00 (2013.01);
Abstract
Disclosed herein are systems and methods related to a handling system used to move a semiconductor substrate within a process chamber during treatment. The handling system moves the substrate back-and-forth between two locations in an arc-like motion around a pivot point, while simultaneously rotating the substrate around its own center point.
Butterbaugh, Jeffery. (2022). Systems and methods for rotating and translating a substrate in a process chamber (U.S. Patent No. 11458512). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11458512
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile