The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2022
Filed:
Apr. 12, 2019
Applicant:
Intel Corporation, Santa Clara, CA (US);
Inventor:
Fai Yeung, Palo Alto, CA (US);
Assignee:
Intel Corporation, Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04N 13/111 (2018.01); H04N 5/232 (2006.01); H04N 13/344 (2018.01); H04N 13/339 (2018.01);
U.S. Cl.
CPC ...
H04N 13/111 (2018.05); H04N 5/23238 (2013.01); H04N 13/339 (2018.05); H04N 13/344 (2018.05);
Abstract
Methods, systems and apparatuses may provide for technology that identifies a seam area between a pair of images corresponding to a first eye and determines a disparity between the seam area and a reference area at a center line of a reference image corresponding to a second eye. The technology may also automatically adjust one or more pre-stitch parameters of camera sensors associated with the pair of images and the reference image based on the disparity.