The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2022
Filed:
Oct. 23, 2020
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Ryuichi Asako, Miyagi, JP;
Tatsuya Yamaguchi, Yamanashi, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/311 (2006.01); B05D 1/00 (2006.01); C23C 16/52 (2006.01); C23C 16/04 (2006.01); C23C 16/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31144 (2013.01); B05D 1/60 (2013.01); C23C 16/0236 (2013.01); C23C 16/047 (2013.01); C23C 16/52 (2013.01); H01L 21/31116 (2013.01);
Abstract
A method is provided. In the method, a substrate having a first region and a second region on a substrate surface is provided. A film deposition material to form a first chemical bond in the first region and a second chemical bond in the second region is supplied to the substrate surface. The second bond has a second bond energy lower than a first bond energy of the first chemical bond. A film is selectively formed in the first region by supplying an energy lower than the first bond energy of the first chemical bond and higher than the second bond energy of the second chemical bond.