The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 27, 2022

Filed:

Mar. 30, 2020
Applicant:

Fei Company, Hillsboro, OR (US);

Inventors:

Bart Buijsse, Eindhoven, NL;

Alexander Henstra, Eindhoven, NL;

Yuchen Deng, Eindhoven, NL;

Assignee:

FEI Company, Hillsboro, OR (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/22 (2006.01); H01J 37/26 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/222 (2013.01); H01J 37/261 (2013.01); H01J 37/32715 (2013.01); H01J 2237/22 (2013.01); H01J 2237/2617 (2013.01);
Abstract

Diffraction patterns of a sample at various tilt angles are acquired by irradiating a region of interest using a first charged particle beam. Sample images are acquired by irradiating the region of interest using a second charged particle beam. The first and second charged particle beams are formed by splitting charged particles generated by a charged particle source.


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