The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 20, 2022

Filed:

Jan. 02, 2020
Applicant:

Applied Materials Israel Ltd., Rehovot, IL;

Inventors:

Ran Badanes, Rishon Le-Zion, IL;

Ran Schleyen, Rehovot, IL;

Boaz Cohen, Lehavim, IL;

Irad Peleg, Tel Aviv, IL;

Denis Suhanov, Ashdod, IL;

Ore Shtalrid, Yavne, IL;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G06K 9/62 (2022.01);
U.S. Cl.
CPC ...
G06K 9/6259 (2013.01); G06K 9/6263 (2013.01); G06T 7/001 (2013.01); G06T 2207/30148 (2013.01);
Abstract

There is provided a method of defect detection on a specimen and a system thereof. The method includes: obtaining a runtime image representative of at least a portion of the specimen; processing the runtime image using a supervised model to obtain a first output indicative of the estimated presence of first defects on the runtime image; processing the runtime image using an unsupervised model component to obtain a second output indicative of the estimated presence of second defects on the runtime image; and combining the first output and the second output using one or more optimized parameters to obtain a defect detection result of the specimen.


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