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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11448963 B1

PDFFull Text
Date of Patent:
Sep. 20, 2022

Filed:

Jun. 14, 2019

Resist composition and method of forming resist pattern

Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;

Inventors:

Masatoshi Arai, Kawasaki, JP;

Takaya Maehashi, Kawasaki, JP;

Koshi Onishi, Kawasaki, JP;

Assignee:

TOKYO OHKA KOG YO CO., LTD., Kawasaki, JP;

Attorney:

Knobbe, Martens, Olson & Bear LLP

Primary Examiner:

John S Chu

Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/30 (2006.01); G03F 7/038 (2006.01); G03F 7/004 (2006.01); C08F 212/14 (2006.01); C08F 220/18 (2006.01); G03F 7/20 (2006.01); G03F 7/16 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0397 (2013.01); C08F 212/22 (2020.02); C08F 220/1807 (2020.02); C08F 220/1812 (2020.02); G03F 7/0045 (2013.01); G03F 7/0382 (2013.01); G03F 7/0392 (2013.01); G03F 7/30 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2004 (2013.01); G03F 7/2037 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01);
Abstract

A resist composition including a base component and an acid generator component, the base component including a resin component having a structural unit (a0) represented by general formula (a0) shown below, and the acid generator component containing at least one of a compound (b-1), a compound (b-2) and a compound (b-3) represented by general formula (b-3) shown below in which Wa represents a divalent aromatic hydrocarbon group; Rarepresents an acid dissociable group; R, Rand Reach independently represents a hydrocarbon group containing an aromatic ring; R, Rand Reach independently represents a cyclic group, a chain alkyl group which may have a substituent or a chain alkenyl group; Rrepresents a fluorine atom or a fluorinated alkyl group of 1 to 5 carbon atoms and M'represents an m-valent onium cation.

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