The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 13, 2022

Filed:

Jan. 10, 2020
Applicant:

Micron Technology, Inc., Boise, ID (US);

Inventor:

Chandra Tiwari, Boise, ID (US);

Assignee:

Micron Technology, Inc., Boise, ID (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/11556 (2017.01); H01L 27/11582 (2017.01); G11C 5/02 (2006.01); G11C 5/06 (2006.01); G11C 16/04 (2006.01);
U.S. Cl.
CPC ...
H01L 27/11556 (2013.01); G11C 5/025 (2013.01); G11C 5/06 (2013.01); G11C 16/04 (2013.01); H01L 27/11582 (2013.01);
Abstract

A memory array comprising strings of memory cells comprises laterally-spaced memory blocks individually comprising a vertical stack comprising alternating insulative tiers and conductive tiers. A horizontal pattern of operative memory-cell pillars extends through the insulative tiers and the conductive tiers in individual of the memory blocks. The operative memory-cell pillars have intrinsic compressive mechanical stress. At least one dummy structure in the individual memory blocks extends through at least upper of the insulative tiers and the conductive tiers. The at least one dummy structure is at least one of (a) and (b), where (a): at a lateral edge of the horizontal pattern, and (b): at a longitudinal end of the horizontal pattern. The at least one dummy structure has intrinsic tensile mechanical stress. Other embodiments, including methods, are disclosed.


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