The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 13, 2022

Filed:

Jan. 31, 2021
Applicant:

Winbond Electronics Corp., Taichung, TW;

Inventors:

Shih-Chieh Lin, Taichung, TW;

Shuen-Hsiang Ke, Taichung, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/302 (2006.01); G01B 11/06 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32963 (2013.01); G01B 11/0683 (2013.01); H01L 21/302 (2013.01);
Abstract

An etching apparatus and an etching method thereof are provided. An end point detector detects a light intensity at a specific wavelength for light generated when an etching process is performed on a material to be processed, and generates an end point detection signal. The material to be processed includes a material layer and at least one mask layer formed on the material layer. A control device determines an etching completion time of the mask layer according to the end point detection signal, calculates a thickness of the mask layer according to the etching completion time, and adjusts an etching time of the material layer according to the thickness of the mask layer.


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Lin, Shih-Chieh. (2022). Etching apparatus and etching method thereof (U.S. Patent No. 11443928). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11443928

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