The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2022
Filed:
Nov. 16, 2017
Tokyo Electron Limited, Tokyo, JP;
Tohoku University, Miyagi, JP;
Masaki Hirayama, Miyagi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A plasma treatment device includes: a chamber body including a chamber defined therein; a gas supply part that supplies a processing gas into the chamber; a stage disposed within the chamber; an upper electrode having a circular surface that faces the stage; a conductor connected to the upper electrode; a high-frequency power supply that generates a first high-frequency wave; a bias power supply that applies a second high-frequency wave or a direct current bias voltage to the upper electrode; an annular insulating ring extending along an outer edge of the circular surface; a waveguide through which electromagnetic waves generated around the conductor based on the first high-frequency wave propagate, the waveguide being connected to the annular insulating ring outside the upper electrode; and a controller that controls the second high-frequency wave or the direct current bias voltage to be applied to the upper electrode.