The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 13, 2022

Filed:

Apr. 05, 2019
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Richard Quintanilha, Heidenheim an der Brenz, DE;

Scott Anderson Middlebrooks, Duizel, NL;

Adrianus Cornelis Matheus Koopman, Hilversum, NL;

Albertus Victor Gerardus Mangnus, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G01B 11/24 (2006.01); G01B 15/04 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70616 (2013.01); G01B 11/24 (2013.01); G01B 15/04 (2013.01); G03F 7/705 (2013.01);
Abstract

A method of determining a measurement sequence for an inspection tool inspecting a structure generated by a lithographic process performed by a lithographic system is presented, the method including deriving a model for the lithographic process as performed by the lithographic system, the model including a relationship between a set of system variables describing the lithographic system and an output variable representing the structure resulting of the lithographic process, determining an observability of one or more system variables in the output variable, and determining the measurement sequence for the inspection tool, based on the observability.


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