The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2022
Filed:
Aug. 25, 2021
Asml Netherlands B.v., Veldhoven, NL;
Jochem Sebastiaan Wildenberg, Aarle-Rixtel, NL;
Marinus Jochemsen, Veldhoven, NL;
Erik Jensen, Veldhoven, NL;
Erik Johannes Maria Wallerbos, Helmond, NL;
Cornelis Johannes Rijnierse, Eindhoven, NL;
Bijoy Rajasekharan, Eindhoven, NL;
Roy Werkman, Eindhoven, NL;
Jurgen Johannes Henderikus Maria Schoonus, Nuenen, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method for optimizing a sequence of processes for manufacturing of product units, includes: associating measurement results of performance parameters (e.g., fingerprints) with the recorded process characteristics (e.g., context); obtaining a characteristic (e.g., context) of a previous process (e.g. deposition) in the sequence already performed on a product unit; obtaining a characteristic (e.g., context) of a subsequent process (e.g., exposure) in the sequence to be performed on the product unit; determining a predicted performance parameter (e.g., fingerprint) of the product unit associated with the sequence of previous and subsequent processes by using the obtained characteristics to retrieve measurement results of the performance parameters (e.g., fingerprints) corresponding to the recorded characteristics; and determining corrections to be applied to future processes (e.g. exposure, etch) in the sequence to be performed on the product unit, based on the determined predicted performance parameter.