The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 13, 2022

Filed:

May. 07, 2018
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Rizvi Rahman, Eindhoven, NL;

Hakki Ergün Cekli, Eindhoven, NL;

Cëdric Dësirë Grouwstra, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G05B 19/418 (2006.01); H01L 21/66 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70191 (2013.01); G05B 19/41875 (2013.01); H01L 22/20 (2013.01); G05B 2219/45028 (2013.01);
Abstract

A device manufacturing method, the method including: obtaining a measurement data time series of a plurality of substrates on which an exposure step and a process step have been performed; obtaining a status data time series relating to conditions prevailing when the process step was performed on at least some of the plurality of substrates; applying a filter to the measurement data time series and the status data time series to obtain filtered data; and determining, using the filtered data, a correction to be applied in an exposure step performed on a subsequent substrate.


Find Patent Forward Citations

Loading…