The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 06, 2022

Filed:

Feb. 18, 2021
Applicant:

United Microelectronics Corp., Hsin-Chu, TW;

Inventors:

Chih-Haw Lee, Hsinchu County, TW;

Tzu-Ping Chen, Hsinchu County, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/28 (2006.01); H01L 29/788 (2006.01); H01L 21/32 (2006.01); H01L 21/321 (2006.01); H01L 29/423 (2006.01); H01L 29/66 (2006.01); H01L 21/3213 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01L 29/40114 (2019.08); H01L 21/31111 (2013.01); H01L 21/32 (2013.01); H01L 21/32105 (2013.01); H01L 21/32133 (2013.01); H01L 29/42328 (2013.01); H01L 29/66825 (2013.01); H01L 29/7883 (2013.01);
Abstract

A split-gate flash memory cell includes a semiconductor substrate having thereon a select gate oxide layer and a floating gate oxide layer. A floating gate is disposed on the floating gate oxide layer. A football-shaped oxide layer is disposed on the floating gate. The floating gate includes tips under the football-shaped oxide layer. A select gate is disposed on the select gate oxide layer and extended onto the football-shaped oxide layer. An inter-poly oxide layer is between the select gate and the floating gate. The inter-poly oxide layer has a thickness smaller than a thickness of the select gate oxide layer. A source region is formed in the semiconductor substrate and adjacent to the floating gate. A drain region is formed in the semiconductor substrate and adjacent to the select gate.


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