The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 06, 2022

Filed:

Dec. 15, 2020
Applicant:

Micron Technology, Inc., Boise, ID (US);

Inventors:

Jeffrey S. McNeil, Jr., Nampa, ID (US);

Karl D. Schuh, Santa Cruz, CA (US);

Vamsi Pavan Rayaprolu, San Jose, CA (US);

Giuseppina Puzzilli, Boise, ID (US);

Kishore K. Muchherla, Fremont, CA (US);

Gil Golov, Backnang, DE;

Todd A. Marquart, Boise, ID (US);

Jiangang Wu, Milpitas, CA (US);

Niccolo' Righetti, Bosie, ID (US);

Ashutosh Malshe, Fremont, CA (US);

Assignee:

Micron Technology, Inc., Boise, ID (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11C 16/34 (2006.01); G11C 16/16 (2006.01); G11C 16/30 (2006.01); G11C 16/32 (2006.01); G11C 16/26 (2006.01);
U.S. Cl.
CPC ...
G11C 16/3495 (2013.01); G11C 16/16 (2013.01); G11C 16/26 (2013.01); G11C 16/30 (2013.01); G11C 16/32 (2013.01);
Abstract

Instructions can be executed to adjust a trim at first intervals until a quantity of program/erase cycles (PEC) have occurred. The trim defines a valley width between data states. Instructions can be executed to adjust the trim at second intervals, greater than the first intervals, after the quantity of PEC have occurred.


Find Patent Forward Citations

Loading…