The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2022
Filed:
Mar. 19, 2020
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Kevin Van De Ruit, Eindhoven, NL;
Roy Werkman, Eindhoven, NL;
Jochem Sebastiaan Wildenberg, Aarle-Rixtel, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 9/7046 (2013.01); G03F 7/7085 (2013.01); G03F 7/70633 (2013.01);
Abstract
A method of determining a set of metrology point locations, the set including a subset of potential metrology point locations on a substrate, the method including: determining a relation between noise distributions associated with a plurality of the potential metrology point locations using existing knowledge; and using the determined relation and a model associated with the substrate to determine the set.
Van De Ruit, Kevin. (2022). Method of determining a set of metrology points on a substrate, associated apparatus and computer program (U.S. Patent No. 11435673). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11435673
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile