The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2022
Filed:
May. 29, 2019
Tokyo Electron Limited, Tokyo, JP;
Shinsuke Oka, Miyagi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
When a plasma processing apparatus changes processing parameters of a plasma processing that include at least a temperature of a stage and a temperature of each zone obtained by dividing a placing surface of the stage into multiple patterns, and measures the temperature of each zone and a supply current to a hater in a state where the temperature is stabilized, an acquisition unit acquires the measurement data. The generator generates a prediction model using the measurement data, assuming that heat with heat quantity proportional to a temperature difference between adjacent zones moves therebetween, heat with heat quantity proportional to a temperature difference between the stage and each zone moves therebetween, heat with heat quantity calculated from the supply current to the heater of each zone is input to the zone, and quantity of heat input and quantity of heat output in each zone are consistent.