The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2022
Filed:
Feb. 18, 2020
Applicant:
Applied Materials Israel Ltd., Rehovot, IL;
Inventors:
Doron Girmonsky, Raanana, IL;
Rafael Ben Ami, Ramat Gan, IL;
Boaz Cohen, Lehavim, IL;
Dror Shemesh, Hod Hasharon, IL;
Assignee:
Applied Materials Isreal Ltd., Rehovot, IL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G06F 17/18 (2006.01);
U.S. Cl.
CPC ...
G06T 7/0008 (2013.01); G06F 17/18 (2013.01); G06T 7/001 (2013.01); G06T 2207/10152 (2013.01); G06T 2207/20076 (2013.01); G06T 2207/20224 (2013.01); G06T 2207/30148 (2013.01);
Abstract
There is provided a method and a system configured to obtain an image of a one or more first areas of a semiconductor specimen acquired by an examination tool, determine data Dinformative of defectivity in the one or more first areas, determine one or more second areas of the semiconductor specimen for which presence of a defect is suspected based at least on an evolution of D, or of data correlated to D, in the one or more first areas, and select the one or more second areas for inspection by the examination tool.