The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2022
Filed:
Nov. 09, 2018
Hamamatsu Photonics K.k., Hamamatsu, JP;
Takashi Kasahara, Hamamatsu, JP;
Katsumi Shibayama, Hamamatsu, JP;
Masaki Hirose, Hamamatsu, JP;
Toshimitsu Kawai, Hamamatsu, JP;
Hiroki Oyama, Hamamatsu, JP;
Yumi Kuramoto, Hamamatsu, JP;
HAMAMATSU PHOTONICS K.K., Hamamatsu, JP;
Abstract
An optical inspection device includes: a wafer support unit configured to support a wafer in which a plurality of Fabry-Perot interference filter portions are formed, each of the plurality of filter portions in which a distance between the first mirror portion and the second mirror portion facing each other varies by an electrostatic force, the wafer support unit configured to support the wafer such that a direction in which the first mirror portion and the second mirror portion face each other follows along a reference line; a light emission unit configured to emit light to be incident on each of the plurality of filter portions along the reference line; and a light detection unit configured to detect light transmitted through each of the plurality of filter portions along the reference line. The wafer support unit has a light passage region that allows light to pass along the reference line.