The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2022
Filed:
Dec. 14, 2020
Nanya Technology Corporation, New Taipei, TW;
Chin-Te Kuo, New Taipei, TW;
NANYA TECHNOLOGY CORPORATION, New Taipei, TW;
Abstract
The present disclosure provides a semiconductor structure having an air gap dielectric and a method for preparing the semiconductor structure. The semiconductor structure includes a substrate; a plurality of conductive pillars disposed over the substrate; a plurality of dielectric pillars, disposed over the substrate, separated from the conductive pillars; a plurality of dielectric caps disposed over the conductive pillars, separated from the dielectric pillars; and a sealing layer disposed over the dielectric pillars and the dielectric caps.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile