The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 16, 2022

Filed:

Jun. 03, 2016
Applicant:

Texas Instruments Incorporated, Dallas, TX (US);

Inventors:

Manoj Mehrotra, Bangalore, IN;

Terry J. Bordelon, Niskayuna, NY (US);

Deborah J. Riley, Murphy, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/092 (2006.01); H01L 27/06 (2006.01); H01L 21/8249 (2006.01); H01L 29/66 (2006.01); H01L 29/417 (2006.01); H01L 21/265 (2006.01); H01L 29/78 (2006.01); H01L 29/165 (2006.01); H01L 29/737 (2006.01); H01L 23/535 (2006.01); H01L 29/10 (2006.01); H01L 29/161 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0623 (2013.01); H01L 21/265 (2013.01); H01L 21/26513 (2013.01); H01L 21/8249 (2013.01); H01L 23/535 (2013.01); H01L 29/1054 (2013.01); H01L 29/165 (2013.01); H01L 29/41783 (2013.01); H01L 29/66242 (2013.01); H01L 29/66575 (2013.01); H01L 29/66628 (2013.01); H01L 29/66636 (2013.01); H01L 29/737 (2013.01); H01L 29/7378 (2013.01); H01L 29/7833 (2013.01); H01L 29/7834 (2013.01); H01L 29/7848 (2013.01); H01L 29/7849 (2013.01); H01L 29/161 (2013.01); H01L 29/6659 (2013.01);
Abstract

An integrated circuit formed on a silicon substrate includes an NMOS transistor with n-channel raised source and drain (NRSD) layers adjacent to a gate of the NMOS transistor, a PMOS transistor with SiGe stressors in the substrate adjacent to a gate of the PMOS transistor, and an NPN heterojunction bipolar transistor (NHBT) with a p-type SiGe base formed in the substrate and an n-type silicon emitter formed on the SiGe base. The SiGe stressors and the SiGe base are formed by silicon-germanium epitaxy. The NRSD layers and the silicon emitter are formed by silicon epitaxy.


Find Patent Forward Citations

Loading…