The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 16, 2022

Filed:

Jun. 15, 2020
Applicant:

Fei Company, Hillsboro, OR (US);

Inventors:

Remco Schoenmakers, Eindhoven, NL;

Jaydeep Sanjay Belapure, Eindhoven, NL;

Assignee:

FEI Company, Hillsboro, OR (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/256 (2006.01); G01N 23/20091 (2018.01); H01J 37/22 (2006.01); H01J 37/244 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/222 (2013.01); G01N 23/20091 (2013.01); H01J 37/244 (2013.01); H01J 37/256 (2013.01); H01J 37/28 (2013.01); H01J 2237/2007 (2013.01); H01J 2237/225 (2013.01); H01J 2237/24485 (2013.01); H01J 2237/2802 (2013.01); H01J 2237/2804 (2013.01);
Abstract

The invention relates to a method of examining a sample using a charged particle microscope, comprising the steps of providing a charged particle beam, as well as a sample; scanning said charged particle beam over said sample at a plurality of sample positions; and acquiring an EELS spectrum for each of said plurality of sample positions. According to the method, it comprises the further steps of scanning, once more, said charged particle beam over said sample at said plurality of sample positions; acquiring a further EELS spectrum for each of said plurality of sample positions; and combining, for each of said plurality of sample positions, said EELS spectrum with said further EELS spectrum. With this, it is possible to acquire rapid information on the sample being investigated, allowing for faster processing of samples.


Find Patent Forward Citations

Loading…