The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 16, 2022

Filed:

Dec. 18, 2020
Applicant:

Fei Company, Hillsboro, OR (US);

Inventor:

Lubomír Tůma, Kanice, CZ;

Assignee:

FEI Company, Hillsboro, OR (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/14 (2006.01); H01J 37/143 (2006.01); H01J 37/21 (2006.01); H01J 37/20 (2006.01); H01J 37/145 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/143 (2013.01); H01J 37/145 (2013.01); H01J 37/20 (2013.01); H01J 37/21 (2013.01); H01J 37/28 (2013.01);
Abstract

A charged particle beam system can include a vacuum chamber, a specimen holder for holding a specimen within the vacuum chamber, and a charged particle column. The charged particle column can include a charged particle source for producing a beam of charged particles along an optical axis and a magnetic immersion lens for focusing the beam of charged particles. The magnetic immersion lens can include a first lens pole disposed adjacent a first surface of the specimen, an excitation coil surrounding the first lens pole, and a counterpole disposed adjacent a second surface of the specimen, the counterpole including one or more magnets disposed on the counterpole.


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