The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 16, 2022

Filed:

Jan. 18, 2018
Applicant:

Asml Netherlands B.v., AH Veldhoven, NL;

Inventors:

Wei Fang, Milpitas, CA (US);

Cho Huak Teh, Los Altos, CA (US);

Ju Hao Chien, New Taipei, TW;

Yi-Ying Wang, Hsinchu, TW;

Shih-Tsung Chen, Hsinchu, TW;

Jian-Min Liao, Hsinchu, TW;

Chuan Li, San Jose, CA (US);

Zhaohui Guo, San Jose, CA (US);

Pang-Hsuan Huang, Hsinchu, TW;

Shao-Wei Lai, Hsinchu, TW;

Shih-Tsung Hsu, Hsinchu, TW;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01); G06T 2200/24 (2013.01); G06T 2207/20081 (2013.01); G06T 2207/30148 (2013.01);
Abstract

A defect displaying method is provided in the disclosure. The method comprises acquiring defect group information from an image of a wafer, wherein the defect group information includes a set of correlations between a plurality of defects identified from the image and one or more corresponding assigned defect types and displaying at least some of the plurality of defects according to their corresponding assigned defect types.


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