The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 09, 2022

Filed:

Jan. 29, 2021
Applicant:

Fuji Electric Co., Ltd., Kawasaki, JP;

Inventor:

Akimasa Kinoshita, Matsumoto, JP;

Assignee:

FUJI ELECTRIC CO., LTD., Kawasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 29/16 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7813 (2013.01); H01L 29/1608 (2013.01);
Abstract

A semiconductor device includes an active region through which a main current passes during an ON state. In the active region, the semiconductor device includes a semiconductor substrate of a first conductivity type, a first semiconductor layer of the first conductivity type, a second semiconductor layer of a second conductivity type, first semiconductor regions of the first conductivity type, gate insulating films, gate electrodes, an interlayer insulating film, first electrodes, a second electrode, first trenches, a second trench, a polycrystalline silicon layer provided in the second trench via one of the gate insulating films, and a silicide layer selectively provided in a surface layer of the polycrystalline silicon layer. The polycrystalline silicon layer and the silicide layer are electrically connected with the gate electrodes.


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