The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 09, 2022

Filed:

Mar. 04, 2021
Applicant:

Kabushiki Kaisha Toshiba, Tokyo, JP;

Inventors:

Katsuhisa Tanaka, Tsukuba, JP;

Ryosuke Iijima, Setagaya, JP;

Shinichi Kimoto, Tsukuba, JP;

Shinsuke Harada, Tsukuba, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 29/16 (2006.01); H01L 29/66 (2006.01); H01L 29/417 (2006.01); H02M 7/537 (2006.01); B60L 13/00 (2006.01); B60L 50/51 (2019.01); B66B 1/30 (2006.01); B61C 9/38 (2006.01);
U.S. Cl.
CPC ...
H01L 29/1608 (2013.01); B60L 13/006 (2013.01); B60L 50/51 (2019.02); B66B 1/308 (2013.01); H01L 29/41741 (2013.01); H01L 29/41775 (2013.01); H01L 29/66727 (2013.01); H01L 29/66734 (2013.01); H01L 29/7806 (2013.01); H01L 29/7813 (2013.01); H02M 7/537 (2013.01); B61C 9/38 (2013.01);
Abstract

A semiconductor device of an embodiment includes a first trench extending in a first direction in a silicon carbide layer; a second trench and a third trench adjacent to each other in the first direction; a first silicon carbide region of n type; a second silicon carbide region of p type on the first silicon carbide region; a third silicon carbide region of n type on the second silicon carbide region; a fourth silicon carbide region of p type between the first silicon carbide region and the second trench; a fifth silicon carbide region of p type between the first silicon carbide region and the third trench; a gate electrode in the first trench; a first electrode, part of which is in the second trench, the first electrode contacting the first silicon carbide region between the fourth silicon carbide region and the fifth silicon carbide region; and a second electrode.


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