The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 09, 2022

Filed:

May. 20, 2019
Applicant:

Kctech Co., Ltd., Anseong-si, KR;

Inventors:

Jong-Tae Joo, Hwaseong-si, KR;

Sang Hyun Kim, Hwaseong-si, KR;

Ho Cheon Jeong, Hwaseong-si, KR;

Jae Yeol Kim, Hwaseong-si, KR;

Assignee:

KCTECH CO., LTD., Anseong-si, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 37/005 (2012.01); B24B 37/30 (2012.01);
U.S. Cl.
CPC ...
B24B 37/005 (2013.01); B24B 37/30 (2013.01);
Abstract

The present invention relates to a substrate polishing system comprising a polishing pad covered on the polishing platen; a plurality of substrate carriers including a first substrate carrier which moves in a state in which a substrate is mounted and performs a polishing process in a state in which the substrate is in contact with the polishing pad on the polishing pad; a monitoring unit of displaying the information including the identity, position of at least one of the substrate carriers; and a control unit of outputting a warning signal and/or changes the operation of operating devices when an error occurs in real time thereby improving the monitoring efficiency and operation reliability of the polishing process of the substrate.


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