The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 02, 2022

Filed:

Apr. 21, 2017
Applicant:

Hitachi High-technologies Corporation, Tokyo, JP;

Inventors:

Yuki Numata, Tokyo, JP;

Hirofumi Sato, Tokyo, JP;

Shigeru Kawamata, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/22 (2006.01); H01J 37/28 (2006.01); H01J 37/26 (2006.01);
U.S. Cl.
CPC ...
H01J 37/265 (2013.01); H01J 37/22 (2013.01); H01J 37/28 (2013.01);
Abstract

To assist an operator in setting an observation conditions, so as to acquire an image with a desired image quality (such as contrast) in a charged particle beam device without falling into trial and error based on the experience of the operator. Therefore, the charged particle beam device includes a stageon which a sample is placed, a charged particle optical system configured to irradiate the sample with a charged particle beam, detectorsandconfigured to detect an electron generated by an interaction between the charged particle beam and the sample, a control unitconfigured to control the stage and the charged particle optical system according to an observation condition set by the operator and configured to form an image based on a detection signal from the detectors, and a displayconfigured to display an observation assist screen for setting the observation condition. The control unit displays, on the observation assist screen, informationrelated to an irradiation electron amount per pixel irradiated onto the sample by the charged particle optical system under the observation condition.


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