The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 02, 2022

Filed:

Feb. 03, 2017
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Takehiro Wajiki, Kyoto, JP;

Tadashi Miyagi, Kyoto, JP;

Tsuyoshi Mitsuhashi, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05C 5/02 (2006.01); B05C 11/00 (2006.01); B05C 11/10 (2006.01); H05F 3/02 (2006.01); G03F 7/16 (2006.01); H05F 3/06 (2006.01);
U.S. Cl.
CPC ...
B05C 5/02 (2013.01); B05C 11/00 (2013.01); B05C 11/1023 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); H05F 3/06 (2013.01);
Abstract

In a substrate processing apparatus, neutralization processing is performed on a substrate by a neutralization device provided in a thermal processing section. In the neutralization device, at least one of a holder that holds the substrate and an emitter that emits vacuum ultraviolet rays is moved relative to another one in one direction. At this time, one surface of the substrate is irradiated with the vacuum ultraviolet rays emitted by the emitter. When the entire one surface of the substrate is irradiated with the vacuum ultraviolet rays, the neutralization processing ends. Thereafter, the substrate on which the neutralization processing has been performed is transported to a coating processing unit in a coating processing section. In the coating processing unit, a film of a processing liquid is formed on the one surface of the substrate on which the neutralization processing has been performed.


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