The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 26, 2022

Filed:

Jul. 13, 2020
Applicant:

Hitachi High-tech Corporation, Tokyo, JP;

Inventors:

Takafumi Miwa, Tokyo, JP;

Yohei Nakamura, Tokyo, JP;

Natsuki Tsuno, Tokyo, JP;

Heita Kimizuka, Tokyo, JP;

Muneyuki Fukuda, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/22 (2006.01); H01J 37/244 (2006.01); G01N 23/2251 (2018.01);
U.S. Cl.
CPC ...
H01J 37/22 (2013.01); G01N 23/2251 (2013.01); H01J 37/244 (2013.01); G01N 2223/07 (2013.01); G01N 2223/507 (2013.01); G01N 2223/646 (2013.01); H01J 2237/2448 (2013.01); H01J 2237/2482 (2013.01);
Abstract

A computing unit generates a to-be-used-in-computation netlist on the basis of a to-be-used-in-calculation device model corresponding to a correction sample, estimates a first application result, on the basis of the to-be-used-in-computation netlist and an optical condition, when a charged particle beam is applied to the correction sample under the optical condition, compares the first application result and a second application result based on a detection signal when the charged particle beam is applied to the correction sample under the optical condition, and corrects the optical condition when the first application result and the second application result differ from each other.


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