The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 26, 2022

Filed:

Jun. 10, 2020
Applicant:

Board of Regents, the University of Texas System, Austin, TX (US);

Inventors:

Bilal Akin, Richardson, TX (US);

Shi Pu, Plano, TX (US);

Enes Ugur, Plano, TX (US);

Fei Yang, Plano, TX (US);

Chi Xu, Plano, TX (US);

Bhanu Teja Vankayalapati, Richardson, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R 31/26 (2020.01);
U.S. Cl.
CPC ...
G01R 31/2621 (2013.01); G01R 31/2642 (2013.01); G01R 31/2644 (2013.01);
Abstract

A method of monitoring a condition of a SiC MOSFET can include (a) applying a first test gate-source voltage across a gate-source of a SiC MOSFET in-situ, the first test gate-source voltage configured to operate the SiC MOSFET in saturation mode to generate a first drain current in the SiC MOSFET, (b) applying a second test gate-source voltage across the gate-source of the SiC MOSFET in-situ, the second test gate-source voltage configured to operate the SiC MOSFET in fully-on mode to generate a second drain current in the SiC MOSFET, (c) determining a drain-source saturation resistance using the first drain current to provide an indication of a degradation of a gate oxide of the SiC MOSFET; and (d) determining a drain-source on resistance using the second drain current to provide an indication of a degradation of contact resistance of the SiC MOSFET.


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